Gas Purifiers

Gas purifiers upgrade industrial-grade gases to the ultra-high purity required by semiconductor processes. Even nitrogen, hydrogen, argon or oxygen rated 5N (99.999%) still carries ppm-level H₂O, O₂, CO, CO₂, CH₄ and NMHC, which cause film defects, interfacial oxidation and yield loss in epitaxy, etch and deposition steps. Purifiers installed at the point of use or on the facility supply header reduce these impurities to ppb or even ppt levels using adsorption, catalytic conversion and getter technologies.

The range covers three types: ambient-temperature POU inline purifiers (5–4000 SLPM, no heating or purge gas required, with 18/24 MPa high-pressure variants); small-flow heated getter purifiers (0.2–150 LPM) that also remove CH₄ and N₂ and allow on-site getter replacement; and large-flow fully automatic units (10–50000 Nm³/h) with parallel adsorption beds alternating between ambient purification and high-temperature regeneration under PLC control for 24-hour uninterrupted supply.

Dedicated models are available for nitrogen, hydrogen (including a liquid-nitrogen cryogenic version), oxygen, rare gases (Ar, He, Kr, Ne, Xe), ammonia, carbon dioxide (including a supercritical CO₂ version), XCDA clean dry air, plus 240 Bar high-pressure units and cost-efficient large-flow ambient units for temporary or standby supply. Typical applications include 300 mm fab process gas supply, display and LED epitaxy, lithium battery dry rooms, optical fiber preform manufacturing and laboratory carrier gas.