Gas Purifiers
POU Ambient-Temperature Gas Purifier
Product Overview
An inline purifier installed at the point of use, removing trace impurities from gases at ambient temperature and pressure through catalytic adsorption, with outlet purity down to ppb levels. Flow range 5–4000 SLPM; connection size, body length and panel configuration can all be customized to site requirements.
Features & Specifications
Standard POU Selection Table
| Model | Max Flow (SLPM) | Nominal Flow (SLPM) | Max Operating Pressure (MPa) | Connection | Length OAL (Face to Face) | Tube OD (mm) |
|---|---|---|---|---|---|---|
| BSP005 | 5 | 0.5 | 6.9 | 1/4"MVCR | 84.1 (3.31"±.03) | 38.1 (1.5") |
| BSP010 | 10 | 1.5 | 6.9 | 1/4"MVCR | 127 (5.00"±.03) | 38.1 (1.5") |
| BSP010A | 10 | 1.5 | 6.9 | 1/4"MVCR | 114.3 (4.50"±.03) | 38.1 (1.5") |
| BSP050 | 50 | 5 | 1.73 | 1/4"MVCR | 208.3 (8.20"±.03) | 50.8 (2.0") |
| BSP050A | 50 | 5 | 1.73 | 1/4"MVCR | 160 (6.30"±.03) | 50.8 (2.0") |
| BSP060 | 60 | 9 | 1.73 | 1/4"MVCR | 208.3 (8.20"±.03) | 76.2 (3.0") |
| BSP075 | 75 | 10 | 1.73 | 1/4"MVCR | 201.7 (7.94"±.03) | 76.2 (3.0") |
| BSP100 | 100 | 12 | 1.73 | 1/4"MVCR | 317.5 (12.50"±.03) | 50.8 (2.0") |
| BSP120 | 120 | 25 | 1.73 | 1/4"MVCR | 254 (10.00"±.03) | 76.2 (3.0") |
| BSP250 | 250 | 40 | 1.73 | 1/2"MVCR | 462.28 (18.20"±.03) | 76.2 (3.0") |
| BSP300 | 300 | 80 | 1.73 | 1/2"MVCR | 439.42 (17.3"±.06) | 101.6 (4.0") |
| BSP500 | 500 | 80 | 1.73 | 1/2"MVCR | 508 (20.00"±.06) | 101.6 (4.0") |
| BSP800 | 800 | 200 | 1.73 | 1/2"MVCR | 702 (27.64"±.06) | 152.4 (6.0") |
| BSP1000 | 1000 | 300 | 1.73 | 1/2"MVCR | 999.24 (39.34"±.06) | 152.4 (6.0") |
| BSP1500 | 1500 | 400 | 1.73 | 3/4"MVCR | 1134.4 (44.66"±.06) | 152.4 (6.0") |
| BSP2000 | 2000 | 1000 | 1.73 | 3/4"MVCR | 1290.32 (50.8"±.06) | 152.4 (6.0") |
| BSP2500 | 2500 | 1100 | 1.73 | 1"MVCR | 1302.4 (51.28"±.06) | 152.4 (6.0") |
| BSP4000 | 4000 | 2000 | 1.73 | 1"VCR | Custom panel | Custom panel |
Only the specifications and configurations of standard models are listed. Please contact us for special requirements.
Detailed Description
Working Principle
The P series uses catalytic adsorption to capture impurities from the source gas onto the adsorbent surface at ambient temperature. Because no heating and no purge gas are required, the unit is compact and inexpensive to install — well suited to mounting directly at the point of use ahead of process equipment.Product Features
・Returnable for regeneration every 1–2 years, with an equipment life of over 20 years ・Built-in high-precision filter, 0.003μm filtration rating ・Flow range 5–4000 SLPM ・With a source gas quality of 5N or better, removes H₂O, O₂, CO, CO₂, H₂ and NMHC to < 1 ppb; removal of acids, bases and refractory compounds is also available ・Connection size, body length and panel configuration can be customizedApplicable Gases
N₂, H₂, O₂, Ar, He, Kr, Ne, Xe, CDA, CH₄, CO₂, Cl₂, BF₃, HCl, GeCl₄, GeH₄, H₂S, H₂Se, HBr, SiHCl₃, SO₂ and more than thirty other specialty gases.Purifiable Gases and Outlet Purity
Different gas and impurity combinations call for different adsorbent formulas. When selecting a model, please provide the gas type, flow rate and required outlet purity.| Formula | Applicable gases | Removable impurities and outlet purity |
|---|---|---|
| 51 | AsH₃、PH₃ | H₂O < 1 ppbV; O₂ < 1 ppbV; metals < 1 ppbV |
| 23 | CDA、O₂、N₂、Ar、He、Kr、Ne、Xe、H₂、D₂、N₂O、NO、CF₄ | H₂O < 100 pptV; CO₂ < 100 pptV; volatile acids < 1 pptV; volatile bases < 1 pptV; organics < 1 pptV; refractory compounds < 5 pptV; metals < 1 ppbV |
| 44 | CDA、O₂、N₂、Ar、He、Ne、Kr、Xe、H₂、CO₂、C₂H₆、C₃H₈、C₄H₁₀、C₂H₂、C₃H₆、C₂H₄、NH₃ | Condensable organics (>C6) < 1 pptV; non-condensable organics (>C3) < 5 pptV; refractory compounds (as HMDSO) < 1 pptV; C₃H₇NO (DMF) < 100 pptV |
| 48 | CDA、O₂、N₂、Ar、He、Ne、Kr、Xe | H₂O < 100 pptV; condensable organics (as toluene) < 1 pptV; non-condensable organics (as butane) < 5 pptV; refractory compounds (as HMDSO) < 1 pptV; volatile acids (as SO₂) < 1 pptV; volatile bases (as NH₃) < 10 pptV |
| 84 | CO₂ | H₂O < 1 ppbV; O₂ < 200 pptV; volatile acids < 1 pptV; volatile bases < 1 pptV; refractory compounds < 1 pptV; condensable organics < 1 pptV |
| 62 | CO | H₂O < 1 ppbV; O₂ < 1 ppbV; CO₂ < 1 ppbV |
| 61 | HBr | H₂O < 1 ppbV |
| 32 | B₂H₆、BCl₃、CClH₃、GeCl₄、GeH₄、H₂S、H₂Se、NF₃、SiCl₄、SiF₄、SiH₂Cl₂、SiHCl₃、SO₂、CHClF₂、BF₃ | H₂O < 1 ppbV; metals < 1 ppbV |
| 60 | HCl、Cl₂ | Hydrocarbons (as toluene) < 1 pptV; Fe / Ni / Mo / Cr / Mn < 14 pptV; H₂O < 15 ppbV |
| 22 | CDA、O₂、CO₂、N₂、Ar、He、Ne、Kr、Xe、H₂、D₂、NH₃、AsH₃、PH₃、GeH₄、SiH₄、N₂O、NO、CF₄、C₂H₂、(CH₃)₂NH (DMA)、(CH₃)₂N₂H₂ (DMHz) | H₂O < 100 pptV |
| 94 | H₂、N₂、Ar、He、Ne、Kr、Xe、H₂/N₂、H₂/noble gas mixtures | H₂O < 100 pptV; CO₂ < 100 pptV; O₂ < 250 pptV; CO < 1 ppbV; volatile acids (as SO₂) < 1 pptV; volatile bases (as NH₃) < 10 pptV; CxHy (45–100 amu) < 10 pptV; CxHy (>100 amu) < 1 pptV; refractory compounds (as HMDSO) < 1 pptV |
| 43 | N₂、Ar、He、Kr、Ne、Xe、H₂、CDA、O₂、CO₂ | Volatile acids < 1 pptV; volatile bases < 5 pptV; organics < 1 pptV; refractory compounds < 1 pptV; metals < 1 ppbV |
| 99 | H₂、O₂、N₂、Ar、He、Ne、Kr、Xe、H₂/N₂、H₂/noble gas mixtures | H₂O, O₂, CO and CO₂ all < 100 pptV |
| 95 | N₂、Ar、He、Kr、Ne、Xe、CF₄、CH₄、C₂H₆、C₃H₈、C₄H₁₀ | H₂O, O₂, CO, CO₂ and H₂ all < 100 pptV; sulfur compounds < 1 ppbV |
| 72 | NH₃、C₂H₄、GeH₄、CSiH₆、C₂H₇N、C₃H₆、SF₆、H₂/SiH₄、C₂H₈N₂、CH₃SiH₃ | H₂O, O₂ and CO₂ all < 1 ppb; organics (>C4) < 1 ppb; metals < 1 ppb |
| 82 | SiH₄ | H₂O, CO₂, O₂, CO and sulfur compounds all < 1 ppb; metal removal < 1 ppb |
