가스 정제기
POU 상온·상압형 가스 정제기
제품 개요
사용 지점 전단(Point of Use)에 설치하는 관형 정제기로, 촉매 흡착 기술로 상온·상압에서 가스 속 미량 불순물을 제거하며 출구 순도는 ppb급에 이릅니다. 유량은 5~4000 SLPM을 아우르고 접속부 치수, 통 길이, 반면 배치는 모두 현장 요구에 맞춰 주문제작할 수 있습니다.
제품 특성
Standard POU Selection Table
| Model | Max Flow (SLPM) | Nominal Flow (SLPM) | Max Operating Pressure (MPa) | Connection | Length OAL (Face to Face) | Tube OD (mm) |
|---|---|---|---|---|---|---|
| BSP005 | 5 | 0.5 | 6.9 | 1/4"MVCR | 84.1 (3.31"±.03) | 38.1 (1.5") |
| BSP010 | 10 | 1.5 | 6.9 | 1/4"MVCR | 127 (5.00"±.03) | 38.1 (1.5") |
| BSP010A | 10 | 1.5 | 6.9 | 1/4"MVCR | 114.3 (4.50"±.03) | 38.1 (1.5") |
| BSP050 | 50 | 5 | 1.73 | 1/4"MVCR | 208.3 (8.20"±.03) | 50.8 (2.0") |
| BSP050A | 50 | 5 | 1.73 | 1/4"MVCR | 160 (6.30"±.03) | 50.8 (2.0") |
| BSP060 | 60 | 9 | 1.73 | 1/4"MVCR | 208.3 (8.20"±.03) | 76.2 (3.0") |
| BSP075 | 75 | 10 | 1.73 | 1/4"MVCR | 201.7 (7.94"±.03) | 76.2 (3.0") |
| BSP100 | 100 | 12 | 1.73 | 1/4"MVCR | 317.5 (12.50"±.03) | 50.8 (2.0") |
| BSP120 | 120 | 25 | 1.73 | 1/4"MVCR | 254 (10.00"±.03) | 76.2 (3.0") |
| BSP250 | 250 | 40 | 1.73 | 1/2"MVCR | 462.28 (18.20"±.03) | 76.2 (3.0") |
| BSP300 | 300 | 80 | 1.73 | 1/2"MVCR | 439.42 (17.3"±.06) | 101.6 (4.0") |
| BSP500 | 500 | 80 | 1.73 | 1/2"MVCR | 508 (20.00"±.06) | 101.6 (4.0") |
| BSP800 | 800 | 200 | 1.73 | 1/2"MVCR | 702 (27.64"±.06) | 152.4 (6.0") |
| BSP1000 | 1000 | 300 | 1.73 | 1/2"MVCR | 999.24 (39.34"±.06) | 152.4 (6.0") |
| BSP1500 | 1500 | 400 | 1.73 | 3/4"MVCR | 1134.4 (44.66"±.06) | 152.4 (6.0") |
| BSP2000 | 2000 | 1000 | 1.73 | 3/4"MVCR | 1290.32 (50.8"±.06) | 152.4 (6.0") |
| BSP2500 | 2500 | 1100 | 1.73 | 1"MVCR | 1302.4 (51.28"±.06) | 152.4 (6.0") |
| BSP4000 | 4000 | 2000 | 1.73 | 1"VCR | Custom panel | Custom panel |
Only the specifications and configurations of standard models are listed. Please contact us for special requirements.
상세 설명
Working Principle
The P series uses catalytic adsorption to capture impurities from the source gas onto the adsorbent surface at ambient temperature. Because no heating and no purge gas are required, the unit is compact and inexpensive to install — well suited to mounting directly at the point of use ahead of process equipment.Product Features
・Returnable for regeneration every 1–2 years, with an equipment life of over 20 years ・Built-in high-precision filter, 0.003μm filtration rating ・Flow range 5–4000 SLPM ・With a source gas quality of 5N or better, removes H₂O, O₂, CO, CO₂, H₂ and NMHC to < 1 ppb; removal of acids, bases and refractory compounds is also available ・Connection size, body length and panel configuration can be customizedApplicable Gases
N₂, H₂, O₂, Ar, He, Kr, Ne, Xe, CDA, CH₄, CO₂, Cl₂, BF₃, HCl, GeCl₄, GeH₄, H₂S, H₂Se, HBr, SiHCl₃, SO₂ and more than thirty other specialty gases.Purifiable Gases and Outlet Purity
Different gas and impurity combinations call for different adsorbent formulas. When selecting a model, please provide the gas type, flow rate and required outlet purity.| Formula | Applicable gases | Removable impurities and outlet purity |
|---|---|---|
| 51 | AsH₃、PH₃ | H₂O < 1 ppbV; O₂ < 1 ppbV; metals < 1 ppbV |
| 23 | CDA、O₂、N₂、Ar、He、Kr、Ne、Xe、H₂、D₂、N₂O、NO、CF₄ | H₂O < 100 pptV; CO₂ < 100 pptV; volatile acids < 1 pptV; volatile bases < 1 pptV; organics < 1 pptV; refractory compounds < 5 pptV; metals < 1 ppbV |
| 44 | CDA、O₂、N₂、Ar、He、Ne、Kr、Xe、H₂、CO₂、C₂H₆、C₃H₈、C₄H₁₀、C₂H₂、C₃H₆、C₂H₄、NH₃ | Condensable organics (>C6) < 1 pptV; non-condensable organics (>C3) < 5 pptV; refractory compounds (as HMDSO) < 1 pptV; C₃H₇NO (DMF) < 100 pptV |
| 48 | CDA、O₂、N₂、Ar、He、Ne、Kr、Xe | H₂O < 100 pptV; condensable organics (as toluene) < 1 pptV; non-condensable organics (as butane) < 5 pptV; refractory compounds (as HMDSO) < 1 pptV; volatile acids (as SO₂) < 1 pptV; volatile bases (as NH₃) < 10 pptV |
| 84 | CO₂ | H₂O < 1 ppbV; O₂ < 200 pptV; volatile acids < 1 pptV; volatile bases < 1 pptV; refractory compounds < 1 pptV; condensable organics < 1 pptV |
| 62 | CO | H₂O < 1 ppbV; O₂ < 1 ppbV; CO₂ < 1 ppbV |
| 61 | HBr | H₂O < 1 ppbV |
| 32 | B₂H₆、BCl₃、CClH₃、GeCl₄、GeH₄、H₂S、H₂Se、NF₃、SiCl₄、SiF₄、SiH₂Cl₂、SiHCl₃、SO₂、CHClF₂、BF₃ | H₂O < 1 ppbV; metals < 1 ppbV |
| 60 | HCl、Cl₂ | Hydrocarbons (as toluene) < 1 pptV; Fe / Ni / Mo / Cr / Mn < 14 pptV; H₂O < 15 ppbV |
| 22 | CDA、O₂、CO₂、N₂、Ar、He、Ne、Kr、Xe、H₂、D₂、NH₃、AsH₃、PH₃、GeH₄、SiH₄、N₂O、NO、CF₄、C₂H₂、(CH₃)₂NH (DMA)、(CH₃)₂N₂H₂ (DMHz) | H₂O < 100 pptV |
| 94 | H₂、N₂、Ar、He、Ne、Kr、Xe、H₂/N₂、H₂/noble gas mixtures | H₂O < 100 pptV; CO₂ < 100 pptV; O₂ < 250 pptV; CO < 1 ppbV; volatile acids (as SO₂) < 1 pptV; volatile bases (as NH₃) < 10 pptV; CxHy (45–100 amu) < 10 pptV; CxHy (>100 amu) < 1 pptV; refractory compounds (as HMDSO) < 1 pptV |
| 43 | N₂、Ar、He、Kr、Ne、Xe、H₂、CDA、O₂、CO₂ | Volatile acids < 1 pptV; volatile bases < 5 pptV; organics < 1 pptV; refractory compounds < 1 pptV; metals < 1 ppbV |
| 99 | H₂、O₂、N₂、Ar、He、Ne、Kr、Xe、H₂/N₂、H₂/noble gas mixtures | H₂O, O₂, CO and CO₂ all < 100 pptV |
| 95 | N₂、Ar、He、Kr、Ne、Xe、CF₄、CH₄、C₂H₆、C₃H₈、C₄H₁₀ | H₂O, O₂, CO, CO₂ and H₂ all < 100 pptV; sulfur compounds < 1 ppbV |
| 72 | NH₃、C₂H₄、GeH₄、CSiH₆、C₂H₇N、C₃H₆、SF₆、H₂/SiH₄、C₂H₈N₂、CH₃SiH₃ | H₂O, O₂ and CO₂ all < 1 ppb; organics (>C4) < 1 ppb; metals < 1 ppb |
| 82 | SiH₄ | H₂O, CO₂, O₂, CO and sulfur compounds all < 1 ppb; metal removal < 1 ppb |
