XCDA 청정 건조 공기 정제기

제품 개요

일반 압축 건조 공기(CDA)를 반도체급 XCDA로 끌어올리는 정제 설비입니다. 여러 개의 흡착 탑을 병렬로 두고 상온 정제와 고온 재생 두 모드를 번갈아 운전하며, H₂O와 CO₂는 100 ppt 이하로, 유기물·산염기·난융성 화합물은 10 ppt 이하로 낮출 수 있습니다. 유량은 10~20000 Nm³/h입니다.

제품 특성

Index Table (Applicable gas: XCDA)

Impurity	BSS22 Outlet
Process	ADS
H₂O	< 100 ppt
CO₂	< 100 ppt
Total organic carbon TOC (as C₃H₈)	< 10 ppt
Acids (as SO₂)	< 10 ppt
Bases (as NH₃)	< 10 ppt
Refractory compounds (as HMDSO)	< 10 ppt
Particles	≤ 1 pcs/m³ (@0.003μm)
Flow range	10–20000 Nm³/h

Only the specifications and configurations of standard models are listed. Please contact us for special requirements.

견적 문의

LINE @baisheng

Email：sales@baisheng-tech.com

전화：+886-2-2598-1958

상세 설명

CDA vs XCDA

Ordinary Clean Dry Air (CDA) only removes water and oil — meeting a dew point and particle spec is enough. XCDA (Extreme Clean Dry Air) goes further, bringing molecular contaminants — carbon dioxide, organics, acidic and basic gases, refractory compounds — down to ppt levels. It is used for purging lithography and metrology tools and for wafer transport environments, preventing AMC (airborne molecular contamination) from causing wafer surface defects (haze) or hazing of optical components.

Process Description

The BSS22 series runs multiple adsorption beds in parallel, alternating between ambient-temperature purification and high-temperature regeneration, with a service life over 20 years.

Product Features

・Outlet H₂O and CO₂ < 100 ppt; organics, acids and bases < 10 ppt ・Fully automatic operation with 24-hour uninterrupted supply ・High purification flow rate, capable of supplying XCDA plant-wide