Nouvelle TGMML 저유기물·저붕소 ULPA 필터 - NIPPON MUKI 전용관 | Baisheng Tech
품번NM-TGMMLNIPPON MUKI 전용관표준 ULPA
NIPPON MUKI 전용관

Nouvelle TGMML 저유기물·저붕소 ULPA 필터

제품 개요

TGMML은 저유기물과 저붕소(Low-Organic / Low-Boron)를 동시에 만족하는 Mini-pleats형 ULPA 필터로 효율은 0.1 μm 기준 99.9995%입니다. 필터 본체의 유기물과 붕소 방출량을 함께 제어하여 반도체 선단 공정과 포토레지스트 민감 구역을 위한 최고 등급 ULPA입니다. 주요 특징 ・ULPA 효율 99.9995% @ 0.1 μm ・저유기물과 저붕소를 동시에 충족 ・Mini-pleats 구조(저압손) ・14nm 이하 AMC 민감 구역 표준 사양 적용 산업: 의료, 제약, 전자

제품 특성

No.ModelEfficiencyW (mm)H (mm)D (mm)Airflow (CMM)Airflow (CMH)Initial PD (Pa)
1TGMML-Z-E4199.9995%@0.1μm305305652.0120147
2TGMML-Z-E4199.9995%@0.1μm305610654.5270147
3TGMML-Z-E4199.9995%@0.1μm457457655.0300147
4TGMML-Z-E4199.9995%@0.1μm6106106510.0598147
5TGMML-Z-E4199.9995%@0.1μm7626106512.5750147
6TGMML-Z-E4199.9995%@0.1μm9156106515.0900147
7TGMML-Z-E4199.9995%@0.1μm12206106520.51230147
8TGMML-Z-E4199.9995%@0.1μm15009156539.02340147
9TGMML-Z-E3899.9995%@0.1μm305305982.0120118
10TGMML-Z-E3899.9995%@0.1μm305610984.5270118
11TGMML-Z-E3899.9995%@0.1μm457457985.5328118
12TGMML-Z-E3899.9995%@0.1μm6106109810.0600118
13TGMML-Z-E3899.9995%@0.1μm7626109812.5750118
14TGMML-Z-E3899.9995%@0.1μm9156109815.5930118
15TGMML-Z-E3899.9995%@0.1μm15009159839.52370118
견적 문의

Email:sales@baisheng-tech.com

전화+886-2-2598-1958

상세 설명

TGMML addresses both of the AMCs that matter most in semiconductor fabs: organics (amines, carbamates) and boron. Used in lithography bays and photoresist coating/developing areas sensitive to both contaminant classes.

Materials & Construction

PropertySpecification
Filter frameALUMINUM
MediaGLASS PAPER
Max. temperature60°C
Relative humidity60%RH
SeparatorHOT MELT ADHESIVE
GasketEPDM
Grille (downstream)-
Grille (upstream)-
SealantPOLYURETHANE RESIN
Max airflowCan be calculated on request
Max final PD (Pa)294

Airflow vs Pressure Drop (representative)

010020030040050002004006008001000Air volume (m³/h)Pressure drop (Pa)TGMML 65mmTGMML 98mm
Representative curves for 1220×610 mm units. 98 mm depth has the lowest PD.

Applications

- Around EUV / DUV lithography equipment - Photoresist coating and development zones - Leading-edge wafer fabs (sub-14 nm)

Selection Notes

- Low-boron only → BGMML is more economical. - Low-organic only → contact Nippon Muki for options. - Both required → choose TGMML (highest grade).

선정 참고자료

주문 전에 등급 사양, 여재 특성, 운전 환경이 요구 조건에 맞는지 먼저 확인하시기 바랍니다.