Nouvelle TGMC 저유기물·저붕소 대풍량 HEPA 필터 - NIPPON MUKI 전용관 | Baisheng Tech
품번NM-TGMCNIPPON MUKI 전용관표준 HEPA
NIPPON MUKI 전용관

Nouvelle TGMC 저유기물·저붕소 대풍량 HEPA 필터

제품 개요

TGMC는 저유기물과 저붕소를 동시에 만족하는 세퍼레이터형 HEPA 필터로 효율은 0.3 μm 기준 99.97%입니다. 유기물과 붕소 두 종류의 AMC를 함께 제어하여 반도체 선단 공정의 대풍량 용도에서 최고 등급을 이룹니다. 주요 특징 ・저유기물과 저붕소를 동시에 충족 ・HEPA 효율 99.97% @ 0.3 μm ・세퍼레이터형(대풍량) ・14nm 이하 공정 대풍량 표준 사양 적용 산업: 의료, 제약, 전자

제품 특성

No.ModelEfficiencyW (mm)H (mm)D (mm)Airflow (CMM)Airflow (CMH)Initial PD (Pa)
1TGMC-Z-E499.97%@0.3μm3053051506.0360249
2TGMC-Z-E499.97%@0.3μm30561015013.0780249
3TGMC-Z-E499.97%@0.3μm45761015020.51230249
4TGMC-Z-E499.97%@0.3μm61061015028.01680249
5TGMC-Z-E499.97%@0.3μm76261015035.02100249
6TGMC-Z-E499.97%@0.3μm91561015042.52550249
7TGMC-Z-E499.97%@0.3μm122061015057.53450249
8TGMC-Z-E499.97%@0.3μm150076015090.05400249
9TGMC-Z-E4299.97%@0.3μm3053052908.5510249
10TGMC-Z-E4299.97%@0.3μm30561029019.01140249
11TGMC-Z-E4299.97%@0.3μm45761029030.01800249
12TGMC-41-E4299.97%@0.3μm61061029041.02460249
13TGMC-51-E4299.97%@0.3μm76061029051.03060249
14TGMC-Z-E4299.97%@0.3μm1500760290132.07920249
15TGMC-50-E42T99.97%@0.3μm610610290503000249±20
16TGMC-62-E42T99.97%@0.3μm760610290623720249±20
17TGMC-56-E48T99.97%@0.3μm610610290563360285
견적 문의

Email:sales@baisheng-tech.com

전화+886-2-2598-1958

상세 설명

TGMC integrates both TG (low-organic) and BG (low-boron) specifications in a separator-type high-airflow frame. Designed for high-flow systems in ≤14 nm fabs that are sensitive to both AMC classes.

Materials & Construction

PropertySpecification
Filter frameALUMINUM
MediaGLASS PAPER
Max. temperature60°C
Relative humidity60%RH
SeparatorALUMINUM
GasketEPDM
Grille (downstream)-
Grille (upstream)-
SealantPOLYURETHANE RESIN
Max airflowCan be calculated on request
Max final PD (Pa)498

Airflow vs Pressure Drop (representative)

0100200300400500010002000300040005000Air volume (m³/h)Pressure drop (Pa)TGMC 150mmTGMC 290mm
Two representative depths shown. 290 mm has slightly higher initial PD but highest airflow.

Applications

- High-airflow AHUs in sub-14 nm fabs - Around EUV / DUV lithography equipment - Centralized HVAC for photoresist coating zones

Selection Notes

- Mini-pleats version → TGML (low PD). - Low-boron only → BGMC is more economical. - Low-organic only → contact for custom.

선정 참고자료

주문 전에 등급 사양, 여재 특성, 운전 환경이 요구 조건에 맞는지 먼저 확인하시기 바랍니다.