BGMML 저붕소 ULPA 필터 - NIPPON MUKI 전용관 | Baisheng Tech
품번NM-BGMMLNIPPON MUKI 전용관표준 ULPA
NIPPON MUKI 전용관

BGMML 저붕소 ULPA 필터

제품 개요

BGMML은 저붕소(Low-Boron) Mini-pleats형 ULPA 필터로 효율은 0.1-0.2 μm 기준 99.9995%입니다. 저붕소 유리섬유 여재를 써서 필터 본체가 붕소 화합물을 방출해 반도체 공정을 오염시키는 것을 막으며, 14nm 이하 선단 공정의 표준 사양입니다. 주요 특징 ・ULPA 효율 99.9995% @ 0.1-0.2 μm ・저붕소 유리섬유 여재(< 10 ppm B) ・Mini-pleats 구조(저압손) ・14nm 이하 공정 표준 사양 적용 산업: 의료, 제약, 전자

제품 특성

No.ModelEfficiencyW (mm)H (mm)D (mm)Airflow (CMM)Airflow (CMH)Initial PD (Pa)
1BGMML-Z-E4199.9995%@0.1-0.2μm305305652.0120147
2BGMML-Z-E4199.9995%@0.1-0.2μm305610654.5270147
3BGMML-Z-E4199.9995%@0.1-0.2μm457457655.0300147
4BGMML-Z-E4199.9995%@0.1-0.2μm6106106510.0598147
5BGMML-Z-E4199.9995%@0.1-0.2μm7626106512.5750147
6BGMML-Z-E4199.9995%@0.1-0.2μm9156106515.0900147
7BGMML-Z-E4199.9995%@0.1-0.2μm12206106520.51230147
8BGMML-Z-E4199.9995%@0.1-0.2μm150012206552.53150147
9BGMML-Z-E3899.9995%@0.1-0.2μm305305982.0120118
10BGMML-Z-E3899.9995%@0.1-0.2μm305610984.5270118
11BGMML-Z-E3899.9995%@0.1-0.2μm457457985.0300118
12BGMML-Z-E3899.9995%@0.1-0.2μm6106109810.0598118
13BGMML-Z-E3899.9995%@0.1-0.2μm7626109812.5750118
14BGMML-Z-E3899.9995%@0.1-0.2μm9156109815.0900118
15BGMML-Z-E3899.9995%@0.1-0.2μm150012209852.53150118
견적 문의

Email:sales@baisheng-tech.com

전화+886-2-2598-1958

상세 설명

BGMML is engineered for advanced semiconductor nodes (≤14 nm). Boron in standard ULPA media can outgas in high-purity airflow and cause unintended p-type doping; BGMML uses low-boron glass fiber with <10 ppm B release.

Materials & Construction

PropertySpecification
Filter frameALUMINUM
MediaGLASS PAPER
Max. temperature60°C
Relative humidity60%RH
SeparatorHOT MELT ADHESIVE
GasketCHLOROPRENE
Grille (downstream)-
Grille (upstream)-
SealantPOLYURETHANE RESIN
Max airflowCan be calculated on request
Max final PD (Pa)294 (245 when H>760)

Airflow vs Pressure Drop (representative)

010020030040050002004006008001000Air volume (m³/h)Pressure drop (Pa)BGMML 65mmBGMML 98mm
Representative curves for 1220×610 mm units. 98 mm depth has the lowest PD.

Applications

- Sub-14 nm semiconductor advanced processes - Lithography bays in wafer fabs - Around photoresist coating / exposure equipment

Selection Notes

- If low-organic is also required, choose TGMML. - For general semiconductor, ATMML is more economical. - Mini-pleats design — lower PD than BGMC (separator type).

선정 참고자료

주문 전에 등급 사양, 여재 특성, 운전 환경이 요구 조건에 맞는지 먼저 확인하시기 바랍니다.