Air Filtration Technology in Semiconductor Manufacturing
Semiconductor processes have the most stringent requirements for air cleanliness in industry. This article provides an overview of multi-layer filtration architecture from external air treatment to cleanroom endpoints, as well as new challenges and solutions brought by advanced process nodes.
Semiconductor manufacturing is one of the industries with the strictest requirements for air cleanliness. Using advanced logic chip factories as example, lithography areas must maintain ISO Class 1-2 grades (no more than 10 particles of 0.1μm per cubic meter), etch and thin film deposition areas typically maintain ISO Class 3-4, while general corridor areas maintain ISO Class 5-6. Achieving such stringent cleanliness requires constructing multi-layer air filtration systems.
Typical semiconductor facility air filtration architecture consists of three defensive lines. The first line is external air treatment units (MAU/OAU), responsible for treating outdoor air to preliminary cleanliness state, typically configured with G4 initial-stage filters plus F7-F9 intermediate filters, some facilities additionally install chemical filters for AMC treatment. The second line is circulating air treatment units (RCU), equipped with H13-H14 HEPA filters for further purification. The third line is endpoint filtration—FFUs (Fan Filter Units) installed on cleanroom ceilings, equipped with H14 HEPA or U15 ULPA filters, providing final ultra-clean air.
As process nodes advance to 3nm and below, air filtration faces new challenges. First, molecular-level contamination (AMC) management has escalated from "detectable" to "non-detectable" standards. Chemical filter efficiency and service life monitoring techniques must advance correspondingly. Second, EUV lithography introduction requires reticle environments with particle and molecular contamination approaching zero. Dedicated reticle storage and transfer systems require independent ultra-clean air supply.
Baisheng Technology long serves major domestic semiconductor facilities, with extensive supply experience from 12-inch wafer fabs to advanced packaging facilities. We provide complete product line from initial-stage to ULPA filters, and can provide optimized filter specification recommendations and configuration solutions based on customer system airflow, space constraints, and cleanliness objectives. Simultaneously, our technical service team can assist customers with filter performance verification, leakage testing, and AMC monitoring and other professional services.
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